In UMC180 nm library, the nominal VT MOSFET devices have 180 nm minimum length. Low VT devices have 240 nm. This invokes some questions in my mind:
- I do not think low VT can be achieved by increasing the length anyway. What is the main reason of the change in minimum L?
- Is it a general phenomenon, or is it a specific instance in UMC 180 nm technology?