I recently compared how different gasses influence crystallisation of thin film. I used Nitrogen, Carbon dioxide (CO2), Argon, Ambient air. And got easy crystalization of Zinc, Iron and Nickle thin film in comparison with thin film prepared in other gasses.
My colleague told me that maybe polarity of nitrogen in my reaction is changed so it become more polar and maybe that is a reason of crystallisation.
I do not anneal the sample and during preparation I use high voltage discharge.
Why this happens only with nitrogen and not other gasses?