I tried with 40 ml of water, Zn acetate, HMT, and Al nitrate at 100 C for various durations.
I used Rf sputtered ZnO seed layer of 40 nm. When I open the lined teflon chamber no trace of film and most interestingly seed layer came out from the glass substrate. Can someone tell me where I went wrong?
Describe your process well please.
1) Substrate preparation - maybe no good cleaning
2) crystal growth - check pH. maybe your seed layer has been etched.
Check our paper: The properties of ZnO nanorods for organic-inorganic solar cell fabricated by wet chemical method
Dear Arindam
you must obtain nano rod . I growth ZnO On Sio2 10 A thickness obtained nano rod I think The Problem returned on your Substrate your substrate may be not good quality
@Abidov : I have used Sputtered deposited ZnO layer of 40 nm grown at 125watt, 20sccm Ar+ 10sccm O2 at temperature 500 C.
Can you suggest how should be the PH value before putting the auto clave into furnace chember??
Dear Arindam,
I have done similar method like you. I would like to know the ZnO seed layer deposition temperature? I think when the deposition temperature is not high enough, then adhesion of the seed layer to the surface of the substrate will be weak. This will affect the growth of ZnO NR in the next process.
Dear Arindam,
I have done a series of work in doping ZnO nanorods by hydrothermal growth, including Sb-doped and Cl-doped. I have tried to dope Al too. Trust me, using Al nitrate won't work, for reasons hard to explain in short words. I have tried that myself, and I'm saving your time. Even if you get nanorods, you won't get Al-doped nanorods. You might have seen papers reporting Al-doped ZnO Nanorods using Al(NO3)3, but they don't convince me due to their inadequate characterization. If you are interested in discussing how to dope Al, feel free to get back to me.
Fei Wang
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