If its MnO2, repeated washing with dilute HCl (1-3%) will remove them..

But, they can also be amorphous carbon particles.. which can be removed by high temperature annealing in inert atmosphere.

Intead KMnO4 you could use KClO3 as oxidante agent avoiding MnO2 intercaled particles.

Thanks Sridhar and Mauro for the help. There was an HCl wash step. I never quite understood the logic behind this. Now I am getting a hold of it. However, will it be possible to explain how HCl removes MnO2? IS this by formation of MnCl2 by the following reaction

MnO2(s) + 4H+(aq) + 2Cl-(aq) -----> Mn2+(aq) + Cl2(g) + 2H2O(l)

Will the formed MnCl2 settle down? or how can this be purified?

Yes. The MnCl2 is very soluble and is leaching from GO. But using KClO3, you no longer deal with solid particles.

Can I ask about your objectives?

thanks

Mauro

I am working on preparing nanoribbons and wanted to do some electrical measurements. This requires very clean NRs. Thanks for the suggestions. Could you forward me the procedure with KClO3?

I'm in dire need of a spin coater to fabricate my SnO2 thin films. Can anybody help me out? I want to control the substrate temperature during the process.

One has to see the compatibility of the coating agent to avoid any change in the structure and hence property of the nano particle,