If I need to fabricate silver nanodots (circular) using EBL which would be the better way out of the two mentioned below?
(1) I use PMMA as a resist.
(2) I use a layer of MMA followed by a layer of PMMA.
In which case would the circularity be better? (I am using 950 PMMA 2%)
The circularity of your nanodots will depend on a variety of parameters such as the diameter of the dots, the thickness of the Ag layer, the ebeam tool and the PMMA development process used, and so on.
As you mention a MMA/PMMA double layer resist stack I assume that you want to fabricate the nanodots via a lift-off process. For larger (d>200nm) and/or thicker (t>20nm) Ag dots a stack like this might be a good or even the only choice. For very small dots and a very thin Ag layer a single PMMA might be the better option, depending on your tool and process.
If you both resist materials available I would simply give both options a try on a test sample and then chose the one showing the better results.
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