Dear Betuel,

Welcome,

I think you need very clean surface . So, you need to make a degreasing of the surface to eliminate any organic residuals using trichlorethylin and then you remove the residuals of trichlorethylin by dipping in aceton and finally washing in deionized water and drying by purging in nitrogen gas. This is a procedure which is normally used in substrate cleaning. So, it is just a proposal for you.

Best wishes

Best wishes

It's very interesting

Dear Abdelhalim Zekry,

Thank you for your suggestions. I might try cleaning the substrates the way that you suggested.Currently, I have been following steps of sonication in DI water , then in ammonia, then rising in water. My goal is increasing surface energy in order to facilitate the surface wettability. For this purpose, I expose the substrates to Argon in plasma after cleaning process.

Best regards, Betul

Dear Betul,

The activation of the surface by subjecting it to argon plasma may lead to surface damage which can increase the interface state. It may be better to activate the surface of the Molybdenum by slightly etching the surface by a suitable etching solution.

Best wishes