I am trying to deposit some thin films on a substrate and then get some images of it with TEM.
but I am not sure how thin the substrate should be.(my first time with TEM)
I heard that I can ion milling it but that costs too much for me.
Could you give more information about the experiment?
The basic principle is self-evident: specimen for TEM must be as thin as possible! :)
Usually the thickness is less than 100 nm.
Good luck!
FIB is best way (and maybe only way), but all depends on what kind of substrate or/and material you are thinking of? If both are conductive the simplest way is to etch it with electrolyte and low current (the best stable current power source). Usually that way will give hole (from one side of sample to another) but near the hole you will have thick enough structure for (even low voltage) TEM observations.
Anyway, there a lot of substrates available so maybe some solutions of the producers may be enough?
https://www.tedpella.com/calibration_html/QUANTIFOIL_TEM_Substrates.htm
Could you give more information about the experiment?
The basic principle is self-evident: specimen for TEM must be as thin as possible! :)
Usually the thickness is less than 100 nm.
Good luck!
Need more information on the film and substrate. General principle is taht the specimen has to be transparent to electrons ( 100 nm or so, depending on material). If the substrate can be selectively detached/ dissolved, and the film can be floated, then it is the easiest. Normally, that is what is done. If detaching is not possible, thinning is the only way.
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