I am using ultraviolet radiation for negative patterning of a thin film and i used acetone as a remover but it is not sufficient to remove all the residual parts.
Dear Rehab, Acetone is commonly used as a photoresist stripper in a ultrasonic bath. But for negative resist, which crosslinks after UV exposure, a stronger organic solvent might be necessary. I use fuming nitric acid to remove negative photoresist, unless it is not used as a dry-etching mask. In that case I first expose it to O2 plasma, followed by fuming nitric acid. Depending on the substrate material one can also use O2-plasma.