What is the sequence of IPA and DI water rinse during wafer cleaning?

21 August 2021 1 611 Report

I want to rinse the wafer with IPA, DI water.

I use those two solutions as much as possible to achieve a spot-free surface.

However, I found that in many literature the sequence of use of IPA and DI water is different. IPA-DI water or DI water-IPA, which is correct?

Varun Pratap Sharma

Deer Taeho Lee,

During wafer cleaning order of chemicals used should be

Acetone>>>IPA>>>DI in utrasonic/multisonic cleaner.

For Silicon wafers you may use the RCA1 and RCA2 cleaning methods.

I am sure you will get the spot-free cleaned surface by using the above suggestion.

Best wishes,

Varun

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