I want to develop an AP-PECVD process. People have used nebuliser/atomiser for feeding monomer, in atmospheric pressure PECVD process .
For example, when we are depositing SiOx coating by PECVD at low pressure, the monomer HMDSO is heated and entered in reaction chamber in vapor phase.If we want to develop similar PECVD process at atmospheric pressure , do we require atomiser? If yes, then why it is required . Also, in this case , shall we first get droplets of particular size by atomiser and shall het it later to convert in vapor or we will inject droplets in liquid phase in the plasma regime.