Hi
I was wondering if anyone had experience with exposing SU8 from the backside of a transparent substrate and could give me an estimate for the relative exposure dose compared to a front side exposure.
The backside exposure is to prevent the overhanging profile if I exposed from the front, as positively sloped features are required.
Im trying to create 50um features which correlates to an exposure dose of 150-250mJ/cm^2. When I used the same protocol as I would for a topside exposure on silicon (produces good results) the features werent even close to being the correct height; as if they hadnt even been exposed really.
Would it be a fair estimate to try an exposure dose around 600-900mJ/cm^2, or could there be any other issue
Thanks
Alex