What is the best way to deposit metal oxide (ETL or HTL) using aqueous salt solution or NPs dispersed solution on TCO? The thin film quality of ETL or HTL on TCO is imp. Since Visible light enter through TCO then it has to reach to active perovskite material via ETL or HTL. I want to know weather growing ETL or HTL metal oxide thin film via direct deposition using metal salt aqueous solution is good or synthesizing metal oxide NPs then dispersing in solvent and spin coating on TCO is better?
The perovskite precursor solution contained a mixture of MAI and PbI2 (1 : 1, molecular ratio) in anhydrous DMF : DMSO 9 : 1 (v/v).
Then, 50 ml of a 1.3 M MAPbI3 precursor solution with an additive (MAAc, volume ratio) was spin-coated at 1000 rpm for 20 sec onto metal oxide surface, followed by annealing at 100 oC for 10 min.
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