I'm looking to deposit PZT thin films using ECR ion-beam sputtering. I'm just wondering if anyone knows what the composition of the sputtering target should be to give the best chance of creating piezoelectric coatings. I can use assistive oxygen in the process if that helps. I assume I will need to do some post annealing too or electrical poling, but at this stage I'm just interested in the target composition.
Hi Callum, You have to try with excess PbO in the PZT target (5 to 20%) to compensate the Pb deficiency in the deposited film.
If you are doing thin films, wouldn't it be better to use PVDF-TrFE and just spray or spin coat it on? g33 (PVDF-TrFE) is 3900 cm^2/C, whereas the best you will get from a PZT material is g33 (PZT-5J) 290 cm^2/C.
Since the output equation is V=P*g33*k33*t, where V=volts, P=pressure (MPa), g33 is stress coefficient, k is coupling coefficient and t is thickness; you will get a lot more output from the PVDF-TrFE copolymer than the same thickness of a PZT formulation.
You still have to crystallize (anneal) and pole, but the polymers are easier to work with and give more output.
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