I am working on metals thermal ALD. Some of the precursor or counter-reactant candidates such as AlCl3, TaF5 etc are in solid state in RT. As I checked literature low vapor pressure precursors delivery system such as Picosolid booster (probably solid state booster) are used in such cases. Can somebody explain this kind of system please? Is it same with assist mode that is used to introduce low pressure precursors?
Further, confer to the following patent.
https://patents.google.com/patent/US20110311726A1/en
Basically, you are increasing the canister pressure by flowing an inert gas into it (for a certain duration) before pulsing the precursor into the chamber.
Hi,
As far as I know, Picosolid booster is the name of the approximation of the heat of solid precursor to get enough vapor for thermal/plasma ALD process, which given by Picosun company. I think only difference with the assisted mode(inert gas flow into heated precursor container and comes out from another pipe to deliver the precursor vapor to reaction chamber) is that the heating of the precursor.
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