I need some chemical to etch iron oxide. very little literature about this. slow etching rate is ok.
Ar ion milling would work for sure, it's not selective but purely physical. For a chemical attack I'd try Cl2, HCl, Br2 or HBr : FeCl3 and FeBr2 are volatile.
I would go for Chlorine plasmas...
thanks for your prompt answer. I wonder if there is any literature about that?
I concur with Dieter, something like HCl should do the trick and it is probably easier to work with and more accesable than some of the pure halogens.
Depending on thichness: Ion Beam etching 100% physicl with Ar can be the best if:
1-CD not critical
2-thichness lower than 0.5µm
Otherwise, prefer plasma etching By Cl2/Ar.
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