I have to make a Schottky diode by using PbS as semiconductor and ITO as metal, for this purpose an uniform PbS film of thickness 250-300 nm is required. What should be the concentration of sample and which method (dropcast/spincoat) is suitable for this film?
I would start with a concentration around 0.5 - 1.0M however both concentration and deposition will change the thickness. To make a uniform film, only the spin coating method would be suited for this; in order to make a 250-300 nm film, you will have to play with the settings of the spin coating to tune the film thickness. Whenever I try to deposit a new material, I will run through a few films of the same concentration spun at different rates (1000, 2000, 3000 rpm) and build a simple relation. However, things like morphology and film uniformity can be affected by the concentration of solution you are using...... there are many more factors involved than simply just thickness.
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