I was trying to deposit Cr and Au on glass substrate with thickness 30:70. I was getting some problem like:-
1. Au is not getting properly adhesion with Cr.
2. Tried with Ti and Au with thickness 10:45 seems all Au film is getting wipe from Ti. What could be the main issue.
Experts please help me out.
Cleaning process of glass substrate:-
RCA1,2 then pirhana.
then ppr deposit before deposit soft bake at 100 degree.
I have been working with thermal coating since last 3-4 years, in my opinion following points needed to take care before going deep into technical
1. Cleaning and choice of glass substrate type (corning willow) is the prime importance.
2. No body has talked about the vacuum level you have to follow for Cr and Au to deposit and you have to take care of it
3. Most importantly the cooling mechanism (water treatment) must be maintained from 18-22 deg. C for proper vacuum level to attained.
4. Deposition rate must be take care properly and go for surface profilometry if possible
Today My vaccum level was 8.69*10-6 mbar
i am using soda lime glass.
same problem.
I have given 65 degree Celsius substrate Temperature.
Please help me out😭
Kapil Bhatt coating plant means? Instrument? Hind High vaccum Thermal Coating
Thomas Breuer
its cheaper then Si wafer, handling of glass substrate is quite easy.
I have two HHV coating system one automatic and one manual , always suffers from leakage problems, errors during thickness monitoring, chamber gaskit/ oring issue, electronic beam issue etc.
Ohhhhh I didn’t face any problem like that. We are also having 2 system
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