You may also see JVSTA 8, 1990 p. 3123 for the adjustable model's immediate use; & JVST B11 (1993) p1895 for the application of the adjustable model to prediction and verification of Ar etch rates, using the ion energy analyser described in JVST A7 (1989) p. 3332.

Good luck with your work in this field; it is a lot of fun and does have great application. Chris Horwitz.

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