The manual page about ISMEAR is a bit cursory. It's difficult to understand which method to use and when. Can you help me understand it with examples (like Au, CuO, etc.)?
For example in case of Au I would use ISMEAR=1 for structural optimization. But, if I am calculating DOS or other very accurate total energy calculations (no relaxation in metals) I generally use ISMEAR=-5.
The rule of thumb of using smearing method in VASP is simple:
- For optimization, Gaussian smearing is safe for all systems (metal, semiconductor and insulator). You may use MP method for metal but should'n use it for semiconductor or insulator.
- For more accurate electronic structure calculation, tetrahedron method should be employed.
- For DFT-MD, fermi smearing is prefer.
However, some background of math and physics behind smearing methods will help you have a clear picture. You may find useful thing here: https://www.vasp.at/vasp-workshop/slides/k-points.pdf