Dear colleagues,
It is know that, the tunneling devices are still potentially viable structures for high-speed electronics and the challenge to creating high-performance, reliable devices is really a materials problem at its core - successful devices will come from looking at new materials, new deposition/growth techniques, and new device structures that allow much better control over interfaces between conductors and insulators. Further, the successful resonant-tunneling devices require ordered/crystalline insulators.
Thin-film materials used in rectenna (metals Au, Al, Cr and Ti, and oxides Al2O3, Cr2O3 and TiO2) were deposited by e-beam evaporation system in our work. Since the standard metals and oxides may not result in good MIM or MIIM devices, either - many researcher have tried over many decades, and the results have just not been good.
İs it reasonable and why to apply the graphene oxide in our work instead of standard oxides (Al2O3, Cr2O3 and TiO2) since it functions as insulator?
Best regards and thanks in advance,
Konstantin.
1. Depends upon the of the property of Graphene/GO/rGO (electrical conductor, exfoliation, etc.) that you want to use.
2. The challenge is to produce single layer Graphene, if it would be possible for people to produce single/bilayer graphene easily, they would not use GO/rGO in the given context.
3. If you want conduction as well as exfoliation, rGO is a good candidate but it is expensive to produce and full of defects (i.e. difficult to have consistency in results).
http://www.sciencedirect.com/science/article/pii/S0008622312002874
4. GO have lesser defects and sheets are few layered but not as conductive relatively, but certainly not insulator. But it depends upon what conductivity are you trying to achieve.
http://www.sciencedirect.com/science/article/pii/S0008622315303936
5. Hence, it all depends upon what you really want- if exfoliation is the priority with some extent of conduction, GO can be a candidate. But, if Conduction is important and layers are secondary- Graphene exfoliated from graphite should be used.
Rest, there are hundreds of articles available on each of the properties of graphene and its derivatives. Good Luck !
Dear Harish V. Kumar,
Thank you for your response.
Since the standard oxides/insulators may not result in good MIM or MIIM devices, either - many researcher have tried over many decades, and the results have just not been good we chose graphene oxide (GO) as the insulator. With respect to electrical conductivity, GO functions as an electrical insulator, because of the disturbance of its sp2 bonding networks. As a product of strong acid/base treatment, the atomic structure of GO is quite disordered compared to the hexagonal lattice of highly crystalline pristine graphene. However, the successful resonant-tunneling devices require ordered/crystalline insulators. Despite its relatively poor crystallinity and hence carrier mobility, GO and its derivatives have shown several promising applications as advanced materials for energy conversion technologies.
İs it reasonable and why to apply the graphene oxide in our work instead of standard oxides (Al2O3, Cr2O3 and TiO2) since it functions as insulator?
Best regards and thank you in advance,
Konstantin.
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