How does RTA differ from furnace annealing in its science?
For RTA, what parameters I can vary to stabilize the temperature? For instance, lets say I want to use RTA at 500 C under nitrogen environment. If i want it done at ramp up time of 100s, and if at this setting i am getting overshoot, can i stabilize it to reduce overshoot?
Rapid thermal annealing is a heat treatment or processing of the wafers to affect specific changes in the atomic arrangement of its layers. In principle any thermal processing of the wafers must be performed in manner not changing its doping profile while affecting thermal annealing. An example is the doping profile after doping by ion implantation if the wafer is annealed in the classical furnaces, it may last longer time leading to the redistribution of dopants and junction depth increase. The rapid thermal annealing accomplished in much shorter time will not lead to appreciable smearing of the junction.
Also, it saves processing energy for semiconductor wafers and therefore it is more green technology.
The process is carried out by directly heating the wafers by strong radiation heating through lamps. The temperature is sensed by thermocouples contacted to the susceptors carrying the wafers. And the output of sensors are used to control the electric power fed to the lamps. The homogeneity of the temperature is achieved by using distributed heating lamps which are controlled separately.
If you decrease the ramp you may reduce the overshoot. You can increase also the mass of the target.
For more information please follow the pdf in the site:https://people.rit.edu/lffeee/lec_rtp.pdf
Best wishes
Dear Hamza,
If you are interested by the results of rapid thermal annealing on mixed cobal-iron spinel oxides you can have a look on the paper:
RAPID THERMAL ANNEALING OF CERTAIN Fe-Co SPINEL OXIDES:
STRUCTURAl MODIFICATION AND MAGNETO-OPTICAL
PROPERTIES, L. Bouet, L. Presmanes, Ph. Tailhades, A. Rousset, R. Legros,
J.Magn.Soc.Jpn., 20, Supplement SI (1996),329-332. (article available on researchgate).
Similar heat treatments can be also carried out with laser spots. See for instance:
Spinel oxides thin films for write-once optical recording with blue laser sources, Ph. Tailhades et al. Transactions of the Magnetics Society of Japan 2 (4) (2002) 198-201.
Patterned ferrimagnetic thin films of spinel ferrites obtained directly by laser irradiation
Pasquet et al. Applied Surface Science 283 (2013) 283–289.
These articles are also available on Researchgate.
Best regards.
Article Patterned ferrimagnetic thin films of spinel ferrites obtain...
Article Spinel oxides thin films for write-once optical recording wi...
Article RAPID THERMAL ANNEALING OF CERTAIN Fe-Co SPINEL OXIDES: STRU...
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