Actually Ag/Cu multilayer have been used as interlayer metals in between ITO transparent conducting oxide as an improved electrode for application in solar cells devices. Alternative multilayer electrode will surely depend on the resistance and mechanical strength values of the metals. If that is to follow: combination of metals with low resistance values will be prepare e.g Ag/Cu, Ag/Al, Cu/Al, or Ag/Pd etc
I myself do not have specific experience with the insertion of very thin metal layer between the transparent ito layers. These layers must be very thin to allow transmission of light and at the same time decrease the sheet resistance of the formed multilayer electrode. Therefore it affects two conflicting requirements. I think you have yourself to survey the used metals and the improvements that have been achieved.
It is not the matter of metal but its allowed thickness and how it is deposited. But i saw the some researchers used Nickel as Hisham said.
Please refer to the paper in the link: Article Impact of thin metal layer on the optical and electrical pro...