does the value of the electrical conductivity of the ITO substrate (tin oxide) influence the quality of the thin layer to be deposited and especially the SEM results or DRX, if the answer is yes, then choose an ito substrate with low electrical conductivity or high electrical conductivity?
The electrical conductivity of the ITO substrate may influence the quality of the thin layer being deposited, as well as the SEM and DRX results. In general, an ITO substrate with low electrical conductivity may be preferable for depositing high-quality thin films, as a low electrical conductivity substrate may reduce the likelihood of electrical charging during the deposition process. This can help to improve the uniformity and morphology of the deposited film. However, the optimal electrical conductivity of the ITO substrate will depend on the specific deposition process and the properties of the thin film being deposited.
Hi Farid Dris
I agree with Badr-Edine Sadoq, of course that electrical conductivity may influence in the quality of the deposited film, but also you can modify other parameter of the whole deposition process for the obtention of a good quality film, obviously depending on the material you work with. Modify for example, concentration of electrolyte, voltage/current, deposition time, activation of the substrate, deposition of a seed layer, some posttreatment, etc.
Regards!
For thin layer deposition the resistance is less as compared to thick layer.
While the SEM and XRD also good for thin layer. However, For xrd, when the layer is thin then results show's the peak of the material as well as the material.
Best wishes
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