Is there any way to use asymmetrical GaN substrates in spin coating processes?

Nandapriya Manivelan @Nandapriya-Manivelan

27 May 2025 0 8K Report

I am facing difficulties in polymer deposition on GaN substrates due to their irregular and asymmetrical shape. The resulting polymer coating is non-uniform, which may be attributed to the disturbed laminar flow of the solution during the spin-coating process. Are there any recommended approaches to overcome this issue?

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