Etch holes are important for the release of sacrificial layers, the flow of etchant, and the maintenance of structural integrity during the etching process. The idea is to determine systematic approaches or software tools that could optimize hole dimensions and spacing to balance etching efficiency with mechanical stability.
Atomic force microscopy or SEM can be used for small samples Raman Spectroscopic mapping for larger areas in micro meters
Are you designing a topology for wet etching or PCE/vapor etching of sacrificial layers?
For isotropic PCE/vapor etching, the lateral etching has a very strong dependence on the hole size. If possible, it is better to create a test structure with many holes of different sizes, etch in the reactor according to your recipe and measure the cross-sections in SEM. Estimate where you can etch to in a reasonable amount of time and draw circles of a certain diameter around the holes and arrange the holes so that the circles overlap minimizing the area of the internodes.
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