I want to create a film of ~1µm of PEG (Mw 900 000 or lower) linked to a Silicium wafer, SiO2 or SiOH bed. Is there a method to do it, Thanks
In my opinion, for a film of 1 micrometer thick it would not make any difference whether it is bound chemically or just deposited on the substrate. The reason for this is that there is sufficient molecular interaction at the boundary to hold the film. You can try to deposit this film from a concentrated solution of PEG in water by dip coating or spin coating. If you find that one coat from a very concentrated (viscous) solution of PEG does not give you uniform films, try multiple coats by spin coating from a more dilute solution. Thickness can be measured by elypsometry or by interference. If would If you need to link it chemically, you may need to form epoxide or ester groups between a previously derivatized silicon (or silicon oxide) substrate and the PEG.
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