I am trying to make a Magnetic tunneling junction (MTJ) where I need to spin coat on MgO surface to create pattern by photolithography. Will it be detrimental to tunneling oxide layer by creating any hydroxil bond or other contamination on the surface?
MTJ: FeGa/ MgO/ Co
You may use the dry plasma treatment to solve your purpose to make the surface more hydrophilic..
Should I do it before spin coating so that resist does not affect the surface?
How long should I do the treatment? and is it low power treatment?
You should begin with measuring how hydrophilic your system is. You do that by putting a drop of the resist that you want to use on the substrate you wan to use and measure the contact angle between them. This is easiest done by photographing the substrat from a pretty 0 angle and then measure the contact angle in the photo. Then you try treating the surface in oxygen plasma and repeat the measurement. do that until your plasma parameters give the results you need.
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