Check out this link You may find what you are looking for:

https://www.researchgate.net/post/How_to_clean_the_MgO_and_Si_substrates_before_deposition_of_thin_films

Dear Vikas,

Generally, plasma cleaning is quite useful tool for contaminants removal.

Regards

hi, clean process is an important step in order to remove contamination. for example,in the case of Si substrate 5per cent HF is important to remove the native oxyde layer (isolant).

Before film deposition a wet clean can be done with acetone/IPA to remove grease and a oxgen plasma is recommended to remove the hydrocarbons on the surface. To get adhesion a sputter etch can be done in the deposition chamber to remove chemisorbed water. This will improve adhesion of thin films considerably.

Thank you all for the valuable suggestions!