I have an XRD diffractogram of thin film with two crystallographic planes visible. One is (110) and another is (211). The intensity of (110) is several times higher than (211). Can I state that (110) is dominant orientation in the thin film?
Apparently yes! But I would suggest you to go for HRTEM to further strengthen your claim.
good luck!
Not necessarily. You should calculate the structure factor for each reflection based on atomic assignments to special positions as best known.
It will be speculative conclusion if u interpret based on relative intensities of the (011) and (112) reflections. Preferred orientation is always referred/ reported as "times random". Hence, you need to know the XRD pattern of random sample of ur system. You have to compare relative intensity of (011) reflection with respect to the (011) reflection of random sample. Common way of doing this is by texture coefficient measurement ( popularly known as Harris method).
First I want recommend to delete the term ¨spectra¨ for difffraction experiments. It is a diffraction pattern or diffractogram but no spectra.
Regarding your main question: you need to know the relative intensities for both reflections which you can simulate by several free-available programs. These programs usually consider many parameters like the structure factors already mentioned by Michael, but also geometrical influences like the used diffraction geometry. If you select the corrrect setttings you can simulate the intensities for both interferences, i.e. 011 and 112 (please note the Laue indexing instead of the Miller indexing of lattice planes used by you but also by Chandan). Other effects are the multiplicity of a diffracting plane but also texture gradients. If you have a changing texture the differences in absorption for diffferent Bragg angles might become important but for me it seems that the Bragg angles of both reflections are perhaps close to each other so that they should have no significant influence. Did you measured in Bragg-Brentano geometry, or did you used the gracing incident technique preferred for thin layers and coatings? Do you apply variable slit? Also these settings have a significant impact on the interpretation!
As others have said, it depends on the structure factors of the 110 and 112 reflections and the geometry of the measurement.
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