I am using Alfa aecar Copper 13382 for LPCVD. I cleaned with acetone only is any special precleaning needed? The optical image looks like some contaminants are there after growth. The Raman did not show the graphene peaks while characterizing directly on copper. How can I identify Graphene on copper using SEM? What should be the typical flow rate of H2 and CH4 for the 1 inch tube furnace. I am attaching some SEM and optical images
I used to clean Cu foil as follows:
acetone-DI water-acetic acid-DI water-acetone- DI-IPA-Dry N2 gun
Before growth, it is always better to reach target temperature under Ar/H2 atmosphere, as well anneal the substrate for example 30 min for surface reconstruction of Cu at high temperature. After growth, cool down the sample to RT at some inert atmosphere.
There is hardly any growth on your samples. Along with proper cleaning you need to optimize your growth parameters. From the images it seems you need to alter your growth parameters.
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