depth profile of the passivation film could be carried out performing XPS measurements after a "controlled" etching on the the stainless steel sample.
For example, you can carried out the etching with Ar ions, using a suitable emission current (eg 10mA) and beam voltage (eg 3kV) resulting in a sample current (of about some microA) for a reasonable time (...perhaps some tens of seconds because the passivation layer should be very thin).
Inn this way, you should obtain (and then compared) by software, a "depth profile spectra" for each selected element region (eg. Cr, Ni, Fe, O, etc.).
thanks a lot sir for replying, can you guide me more which software should I use for "depth profile spectra" and please one more tell me about cationic fraction.
during my work with surface analysis techniques, several years ago, I used an XPS-Auger system of the company VG Instruments, model Escalab 210, which had a software dedicated to this type of measures. Currently I no longer use this instrument but I think there are many more usable and performing systems and softwares on the market (and in different laboratories).
In XPS sputter depth profiles, the cationic fractions of both the metals and their oxidized species are often plotted as a function of sputter time. For example, regarding surface films containing Fe compounds, the reduction of Fe (III) to Fe (II) during the sputter process does not permit a realiable differentiation between them. Thus, sometimes, the sum of both species is presented and plotted as Feox.