I have tried with LPCVD and ICPCVD but, they wont work because of large thickness. I need 960 nm thickness on quartz substrate. Now I am using 4 target deposition but the quality is very bad. There are lot of crack in deposition.
What about dip coating from a sol-gel solution, followed by a slow heating? Or, better, spin coating ? This method is known for providing excellent, optical-quality, thin coatings on many substrates.
You can try thermal evaporator since your film thickness is about a micron thick. Also you can try spray coating or thin film applicator to cast your film with a gol gel precursor.
Could you please tell me that, dip coating or spin coating will allow me to do patterning using EBL ? I am not much aware about spin coating process of Amorphous Si. Ultimately at the end, I want to grow Si cylinder on the top of Quartz substrate. The cylindrical disk diameter is 200 to 500 nm (variable) with height of 960 nm.