Can we used DC/RF sputtering technique for synthesizing such very thin films for gas sensing application?. If not than which physical vapor deposition (PVD) method is most appropriate.
Dear Arvind Kumar,
Some similar work have been reported, you can have a look at the thesis "Bipolar pulsed sputtering of MoSx coatings:plasma diagnostics, micro-structural andtribological study", from E. Wieers
Regards,
Emile HAYE
Kindly have a look at this link pubs.rsc.org/en/Content/ArticlePDF/2015/NR/c5nr06144j
Dear Arvind Kumar,
I work at Oxford Instruments Plasma Technology we have developed a process and tool for plasma enhanced PVD of MoS2 layers. If you have any interest please contact me and I will be able to help further.
http://www.oxford-instruments.com/products/etching-deposition-and-growth/processes/growth-processes/mos2
Arvind, you can utilize pulsed laser deposition (PLD) for TMD thin film deposition. There are several reports that have come out recently that might be instructive:
1. MoS2: http://pubs.acs.org/doi/abs/10.1021/acsnano.6b01636
2. WSe2: http://aip.scitation.org/doi/abs/10.1063/1.4986851
3. WTe2: http://aip.scitation.org/doi/abs/10.1063/1.4995227
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