We usually use the Cu foil (80um) for growth of h-BN by using horizontal flow - CVD.
There is a problem. It is that the Cu deposited on the quartz during the CVD process.
To remove the Cu as deposited on the quartz, We try to annealing(1080ºC) the quartz at air-atmosphere.
But, the Cu was not removed and was burned.
Could you anyone tell me about how to remove the Cu deposited on the quartz?
Thank you.
Jang Hyunwoo
Nitric acid and do not anneal. If you have the copper diffusing into the glass and then you'll never remove it.
As others told, You can easily wash the copper with 1-2 molar HNO3. You can do this in a glass Beaker and a hot plate magnetic stirrer at the pulp density around 10% (10 gr solid in 100 ml liquid). The quartz will not react with nitric acid.
Ammonia leaching or sulfuric acid leaching in combination with simultaneous oxidation by H2O2 or oxygen would dissolve the native copper.
The melting point of copper is 1083 C, if I recall correctly. Thus I am convinced you’ve formed a glass incorporating Cu. You no longer have a film and I think you’re going to have to scrap the piece. I’m not sure how you came to the conclusion that heating the piece to 1080 C would be helpful.
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