FeGaB thin films were deposited through RF sputtering, however, the films underwent oxidation resulting in the formation of a thin Fe2O3 layer.
This oxidation adversely affects the accuracy of surface measurements, such as MOKE and XPS.
Is there a technique available to remove the oxide layer from the surface?
Alternatively, how can I prevent oxidation of the samples ?
In my opinion there is no easy way for preventing from thin metall films oxidation in air atmosphere. Once the sample is exposed to air the surface will absorb moisture or O2 molecules and oxide layer will be formed. Ideally, the sample with thin film should be transefered from vaccum chamber to another equipment in vacuum or inert atmosphere. If inert gases are used it should be with high purity. To avoid oxidation you can try silica gel desiccator or boxes with inert gases. Ion beam etching could be used for removing of oxide layer but I dont know does XPS measurement system has one.
for some materials one can prevent oxidation by depositing a thin capping layer on top of the film.
it works for example for TiN - we applied a few nm of Al on top which formed Al2O3 upon air exposure thus passivating the surface. Ti 2p and N 1s spectra from such sample was identical to that published for the in situ work. see here for more details:
doi.org/10.1116/1.4916239
doi.org/10.1016/j.apsusc.2016.10.152
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