How to perform alignment marks in e-beam lithography of graphene (FET) fabrication?

09 September 2013 1 7K Report

Graphene is deposited on Si/SiO2 and I want to make graphene based FET. For that I need alignment marks to identify graphene sheets on the substrate in e-beam lithography. I want to deposit two electrodes at the ends of the graphene.

Mir Waqas Alam

For graphene you can use the photomask during lithoprapgy followed by liftoff technique and u can use metall mask or even lithography for electrode fabrication.

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