05 September 2022 5 3K Report

I'm working on the exfoliation of monolayer WTe2 on SiO2 substrate in order to create a heterostructure for transport measurements, and I'm having trouble getting thin layers. I tried various methods in the answers under the question "How to mechanically exfoliate tmds on SiO2", but it didn't work out. What I usually do is to put a piece of crystal on a tape and fold the tape many times so that the crystals are all over the tape. Then I press the tape gently on to a wafer that is either untreated, acetone + IPA cleaned, or O2 plasma cleaned. After that I heat the tape and the wafer to a 80 degrees hot for a few minutes. Finally I detach the tape from the wafer as slowly and as smooth as possible. All the processes above are done in a glove box. What I get on the wafer are just thick and small flakes (yellow) accompanied by smaller blue fragments.

Can anyone share a precise exfoliation process suitable for WTe2? Many thanks in advance.

More Weifeng Zhi's questions See All
Similar questions and discussions