I am trying to extract electron mobility values from FET transfer curves using the equation µ = [L / W*Ci*Vd]*[∂ISD / ∂VGg] where L and W are the respective length and width of the channel and Ci is the gate channel capacitance per unit area. I am using Si wafers with a 300 angstrom SiO2 layer as the dielectric. Should I be using a known value for this or should I be measuring it on each device? If I measure capacitance, should I be measuring a single value that I then divide by the area of my contact pads to the surface?
(Note, this equation comes from Podzorov, V. et al. Critical Assessment of Charge Mobility Extraction in FETs, Nature Materials 17, 2-7 (2017))