Hello!
I'm trying to modulate the electron density in a thin layer of InGaAs highly doped (25nm, 1e19cm-3 n-doped) using field effect with a MOS-like structure, but for the moment, I can only change about 1e17cm-3 of the free electron density (Hall effect measurement) when I apply a +/-4V gate voltage.
Our computation using 1D-Poisson code '(Sneider's one) shows a much larger modulation (about 5e18cm-3). We are not sure what was not taken into account in the computation.
Is this feasible to modulate such large electron density? I'm searching in the literature but I haven't found any study about this. In MOS transistor I saw doping levels of 1e17cm-3 but not as high as what I'm studying.
Thanks!
N. LE-Tuan