I am trying to create micrometer-size SiO2 grass by dry ething a SiO2 wafer. Anyone happen to see SiO2 grass during their fab? What is the condition you get this? Pressure, gas, power and flow? Best,
Tried before, but I believe the effect varies across different machine. Just to share my experience, you may try using PMMA as resist, then etch using CHF3 and Ar gas with high RF power, like 200 or 250W. Other parameters are not substantial. The PMMA will be etched through after some time and then grasses might be produced on the SiO2.