How to co-sputter vanadium oxide with tungsten (using reactive DC sputtering) in order to obtain a W_x V_(1-x) O_2 thin film on Si(100) ?

25 June 2018 0 2K Report

Our sputtering system has two DC guns. In one gun, Vanadium metallic target would be placed and in the other tungsten metallic target. I plan to co-sputter these two targets using reactive dc sputtering (in the presence of Ar and O2 plasma), in order to deposit W_x V_(1-x) O_2 thin film.

Can the film be deposited ?

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