Dear all members,

I am facing an issue in the production of thin-film coatings by large area sputtering coating chambers.

The problem is that during the production coating runs and in the deposition process there is a huge formation of clusters on side walls of the chamber. The formed clusters were facing an issue on the coating of glass substrates, which results to damage the product of the coating.

In which way we can solve this isuue.. can any one suggest and give an idea for the same.

Thanking you.