One of the unites of magnetization is emu/g but in thin film its mass measurement is a problem.
When making the calculation have in mind that generally the density of thin film is less than the density of bulk counterpart due to the free space in the film. If the film is thick enough (say about a micron) you can determine its density by weighing the substrate prior to and after deposition of the film. For thinner films the film density might be determined by optical means using effective medium approximations and density of the bulk material (see the attached paper).
If the density of material is known to you.
Jsut measure the thikness and area of thin film you can get more acurate measurements if your film is highly uniform over the sustrate surface.
Calcuate using mass, volume and density relation
Regards
I agree with the answer made by Ganesh Lanakar, you can simply measure the mass by doing this calculation.
When making the calculation have in mind that generally the density of thin film is less than the density of bulk counterpart due to the free space in the film. If the film is thick enough (say about a micron) you can determine its density by weighing the substrate prior to and after deposition of the film. For thinner films the film density might be determined by optical means using effective medium approximations and density of the bulk material (see the attached paper).
I can to add to the Tsvetanka's advice.
1. Separate a small piece of film
2. Weigh the substrate together with the film.
3. Remove film by etching
4. Weigh remainder of the substrate.
5. Difference in mass is the mass of the film.
I am agree with the Sergey,s method but for that u require a highly sensitive microbalance
and his method is destructive one for that you have to loose your deposited film
instead measure the weight of substrate prior to deposition and measure the substrate with film after deposition
Of course, I agree with the methods described above
Just in case that you might find this usefull, one possible more method ...
For very thin films (ex. nm to several 100 nm), and which are not too rough (that also implies that the substrate is of very low roughness, e.g. Si wafer), the density AND the thickness of the film can be deduced from X-ray reflectivity (XRR) measurements
Regards
cristian
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