We have successfully developed micellar structures of P4VP after annealing silicon nitride wafers(thickness 270 microns), spin coated with PS-b-P4VP in toluene. Recently, we are trying to develop the same structure on 100nm silicon nitride films.

Under optical microscope, the image of this film would always look as if the polymer layer is barely there. Under Atomic force microscope, the well ordered structure is only there where I assume the polymer is present.

After spin coating the film tend to shrink, but after sometime it would lie flat.

I want to have an even distribution of the polymer film throughout the silicon nitride.

Any suggestion, reasoning, and/or requirement to develop the well ordered structure would be greatly appreciated.

Thank you,

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