Is there any special substrate treatment procedure is available before electrodeposition?
Hi Raj, maybe do a oxygen plasma treatment on your samples. It can somehow bring cleaning effect & induce OH-terminal groups on the surface of your metal substrates. It may improve the adhesion property for your experiment.
Yous could also try reactive ion etching (RIE), but I have only used this on ceramic materials, and I'm not sure how well it will work on metals.
Hi Vasanth, In addition with the above suggestions you can also try thermal annealing of the thin film but you need to optimize the conditions if you are looking for a continuous film.
I usually used the acid or alkaline cleaning, or electrolyte-cleaning process.
Hi Raj,
Try and take a look in this book : http://onlinelibrary.wiley.com/book/10.1002/9780470602638 Chapter 23 it refers to the issue of cleaning prior to electrodeposition, mentions about deposition on Cu and Al as well as has literature on claening of metals for electrodeposition.
The above mentioned solutions ofcourse can help you as well but there will be issues, i.e. plasma cleaning helps but once you do you plasma cleaning and expose Al in oxigen forms oxide layer which whatever you deposit on top lets say might not "like" it :). On the other hand you can use this oxide layer as protection, you can etch it directly before your electrodeposition and have a clean surface.
Good luck :).
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