28 October 2019 4 10K Report

Hi. I did intercalation using NMP and crystal is attatched to the substrate using mechanical exfoliation. I did annealing after exfoliation so that crystal is attached to the substrate well. But after all experiment was done, some residue from NMP remained on the surface of substrate. I would like to clean it out but i don't know how i can remove only NMP while keeping the crystal untouched. Is there anyone who knows?

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