How can I reduce the regosity of the deposited aluminum using an electron beam evaporation?

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Aaron Windsor

What crucible are you using? What rate are you depositing at?

Martin Goodchild

There could be a number of contributing factors for this, including: substrate material, substrate cleanliness, substrate temperature, vacuum conditions, deposition rate, film thickness and initial growth/nucleation.

Shelender Kumar

You can try depositing at a low rate (maybe 0.2-0.5A/sec), I am assuming that you have a good vacuum in the chamber so the mean free path is higher for aluminium atoms. You can also try to heat the substate if possible.