I am depositing WS2 thin films using magnetron sputtering to be used as electrode material for supercapacitive application. I have tried various substrates( Stainless steel, ITO) but failed to obtain good adhesion. I have also tried depositing WS2 on wetting layers( Au,Ti, Cr), still my electrode was not able to sustain long.
Is there any other way i could try to improve my thin film adhesion?
Hi, you may like to add a Ti interlayer. The adhesion will be excellent. Please refer some of our published work.
I already tried using Ti wetting layer, the adhesion was much better. However, when i performed CV, the material could not sustain even in neutral electrolytic conditions.
Hi, you can use Pt/Ti/SiO2/Si as a substrate and it will definitely helpful for you. You can find alot of literature on it.
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