I want to obtain n, k (complex refractive index) of the few-layered MoS2 overlying on the SiO2/Si substrate from the ellipsometry experimental data Psi & delta collected at various incidence angles. I start to use the refFIT free software for this task. I find this software very interesting and useful, but I am struck at two simple questions.
1. when I import Psi & delta into the refFIT program, how should I define them in the dataset manager? I cannot find Psi & delta in the list of input quantities?. Do I have to convert Psi & delta into other parameters listed in the input quantities?.
2. The sample was bought from a seller. Since the sample is covered entirely with MoS2, we could not take a reference measurement on the substrate alone. I know the information of SiO2 thickness, DC resistivity of the Si wafer. How can I make use of this information for the model?. Is there a way to include this information to obtain n, k of substrates?.
I appreciate any help you can provide.
Dear Rajeshkumar.
I have been struggling with something similar a few weeks ago. In the mean time, I had to leave it on stand-by so I will not be able to help much. Anyway, I think you can use a multilayer model (-33) even if it is only 1 layer. As such, psi and delta quantities may go in as E1 and E2 directly if in degrees (assuming reflection mode). Please have a look at section 4.7.12 of the manual. For further details I suggest you contact refFIT for help. They are always eager to help in explaining how you can use this software.
Best of luck.
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