Hi! I need zinc oxide or titanium oxide to be filled into etched area on glass sbstrate. Etched are is being photolithography processed and being dry etched. Material must not present around the etched area, so need a method to fill only etched area. Is there anyone experienced similiar application to give me some suggestions?
It sounds like your application is a good candidate for our 3 axis coating systems. https://www.sono-tek.com/products/?proid=492
Hi Robb Engle , thank you for your answer. I checked your systems but their minimum feature size is 15 microns if I didnt missunderstand. I need to fill one of the materials I mentioned into patterns below 12 microns width.
Hi, I have read your question that you have form a series of etched pattern on the glass substrate. so, why not coat or spin a more thick resist before the photo-lithography process, and then try not to remove the rest resist after a etching process. So, the rest resist can behave as a mask when you filling the zinc oxide or titanium oxide. And the filling technique can be sputtering coating or reactive deposition.
Chen Guodong thank you for your answer! Would i get a white coloured or transperent coating by doing deposition?
Dear Chen Guodong , what's thin film coating colour of ZnO? is it white or transparent?
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